paper

Large Magnetoresistance of a Dilute -Si/SiGe/Si Quantum Well in a Parallel Magnetic Field

arXiv:0807.2709 · doi:10.1103/PhysRevB.79.205310

Abstract

We report the results of an experimental study of the magnetoresistance in two samples of -Si/SiGe/Si with low carrier concentrations =8.2 cm and =2 cm. The research was performed in the temperature range of 0.3-2 K in the magnetic fields of up to 18 T, parallel to the two-dimensional (2D) channel plane at two orientations of the in-plane magnetic field against the current : and . In the sample with the lowest density in the magnetic field range of 0-7.2 T the temperature dependence of demonstrates the metallic characteristics (0). However, at =7.2 T the derivative reverses the sign. Moreover, the resistance depends on the current orientation with respect to the in-plane magnetic field. At 13 T there is a transition from the dependence to the dependence . The observed effects can be explained by the influence of the in-plane magnetic field on the orbital motion of the charge carriers in the quasi-2D system.

revised: included AC conductivity experiments to study the role of localized state in transport; total 6 pages, 7 figures. Accepted PRB; to appear vol.79, Issue 20

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