191 citations · 211 across the 7 of their papers we have counts for
3 papers · 1 filter
Plasma-assisted Discharges and Charging in EUV-induced Plasma
Mark van de Kerkhof, Andrei M. Yakunin, Vladimir Kvon +4
In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. Thi…
Particle lofting from substrate exposed to plasma and electron beam
P. V. Krainov, V. V. Ivanov, D. I. Astakhov +4
A nanometer-sized dielectric particle lying on a dielectric substrate is exposed to the flux of low-energy electrons, ion and electron fluxes from a cold plasma and the fluxes from…
Dielectric particle lofting from dielectric substrate exposed to low energy electron beam
P. V. Krainov, V. V. Ivanov, D. I. Astakhov +4
The particle-in-cell simulation is applied to study a nanometer-sized dielectric particle lofting from a dielectric substrate exposed to a low energy electron beam. The article dis…