activity
20092023
most citedResistless EUV lithography: photon-induced oxide patterning on silicon

32 citations · 96 across the 7 of their papers we have counts for

collaborators

7 papers

physics.app-ph2023★ 32 cited

Resistless EUV lithography: photon-induced oxide patterning on silicon

Li-Ting Tseng, Prajith Karadan, Dimitrios Kazazis +7

In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated Si(100) surface in the absence of a photoresist. EUV lithography is the leading litho…

cond-mat.str-el2021★ 5 cited

Energy efficient manipulation of topologically protected states in non-volatile ultrafast charge configuration memory devices

Anze Mraz, Rok Venturini, Michele Diego +13

Non-volatile magnetic storage, from 1940s magnetic core to present day racetrack memory and magnetic anisotropy switching devices rely on the metastability of magnetic domains to s…

physics.app-ph2018★ 10 cited

Improving the Resolution and Throughput of Achromatic Talbot Lithography

Dimitrios Kazazis, Li-Ting Tseng, Yasin Ekinci

High-resolution patterning of periodic structures over large areas has several applications in science and technology. One such method, based on the long-known Talbot effect observ…

physics.app-ph2018★ 9 cited

Changes in the near edge X-ray absorption fine structure of hybrid organic-inorganic resists upon exposure

Roberto Fallica, Benjamin Watts, Benedikt Rösner +4

We report on the near edge X-ray absorption fine structure (NEXAFS) spectroscopy of hybrid organic-inorganic resists. These materials are nonchemically amplified systems based on S…

physics.app-ph2017

Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography

Roberto Fallica, Dimitrios Kazazis, Robert Kirchner +4

Pattern transfer by deep anisotropic etch is a well-established technique for fabrication of nanoscale devices and structures. For this technique to be effective, the resist materi…

physics.chem-ph2017★ 16 cited

A comparative study of resists and lithographic tools using the Lumped Parameter Model

Roberto Fallica, Robert Kirchner, Dominique Mailly +1

A comparison of the performance of high resolution lithographic tools is presented here. We use extreme ultraviolet interference lithography, electron beam lithography, and He ion…

physics.optics2009★ 24 cited

Magnetic metamaterials in the blue range using aluminum nanostructures

Yogesh Jeyaram, Shankar K. Jha, Mario Agio +2

We report an experimental and theoretical study of the optical properties of two-dimensional arrays of aluminum nanoparticle in-tandem pairs. Plasmon resonances and effective optic…