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physics.app-ph2023★ 32 cited
Resistless EUV lithography: photon-induced oxide patterning on silicon
Li-Ting Tseng, Prajith Karadan, Dimitrios Kazazis +7
In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated Si(100) surface in the absence of a photoresist. EUV lithography is the leading litho…
physics.app-ph2018
Changes in the near edge X-ray absorption fine structure of hybrid organic-inorganic resists upon exposure
Roberto Fallica, Benjamin Watts, Benedikt Rösner +4
We report on the near edge X-ray absorption fine structure (NEXAFS) spectroscopy of hybrid organic-inorganic resists. These materials are nonchemically amplified systems based on S…