most citedAnomalous thermal oxidation of gadolinium thin films deposited on silicon by high pressure sputtering

12 citations · 44 across the 5 of their papers we have counts for

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5 papers

cond-mat.mtrl-sci2024★ 12 cited

Anomalous thermal oxidation of gadolinium thin films deposited on silicon by high pressure sputtering

María Ángela Pampillón, Pedro Carlos Feijoo, Enrique San Andrés +2

Thin gadolinium metallic layers were deposited by high-pressure sputtering in pure Ar atmosphere. Subsequently, in situ thermal oxidation was performed at temperatures ranging from…

cond-mat.mtrl-sci2024★ 6 cited

Gadolinium scandate by high-pressure sputtering for future generations of high-k dielectrics

Pedro Carlos Feijoo, María Ángela Pampillón, Enrique San Andrés +1

Gd-rich gadolinium scandate (Gd2-xScxO3) was deposited by high-pressure sputtering on (100) silicon by alternating the deposition of lower than 0.5 nm thick films of its binary com…

cond-mat.mtrl-sci2024★ 6 cited

Scavenging effect on plasma oxidized GdO grown by high pressure sputtering on Si and InP substrates

María Ángela Pampillón, Pedro Carlos Feijoo, Enrique San Andrés +3

In this work, we analyze the scavenging effect of titanium gates on metal insulator semiconductor capacitors composed of gadolinium oxide as dielectric material deposited on Si and…

cond-mat.mtrl-sci2024★ 8 cited

High-k gadolinium scandate on Si obtained by high pressure sputtering from metal targets and in-situ plasma oxidation

María Ángela Pampillón, Enrique San Andrés, Pedro Carlos Feijoo +1

This article studies the physical and electrical behavior of Gd2-xScxO3 layers grown by high pressure sputtering from metallic Gd and Sc targets. The aim is to obtain a high permit…

cond-mat.mtrl-sci2024★ 12 cited

Optimization of gadolinium oxide growth deposited on Si by high pressure sputtering

Pedro Carlos Feijoo, María Ángela Pampillón, Enrique San Andrés

High k gadolinium oxide thin layers were deposited on silicon by high-pressure sputtering (HPS). In order to optimize the properties for microelectronic applications, different dep…