236 citations · 294 across the 6 of their papers we have counts for
6 papers
Perfect Absorption in the Critically Damped Regime
Viacheslav V. Medvedev
We revisit the conditions for perfect electromagnetic absorption in a homogeneous lossy layer on a reflecting substrate. Using phasor diagram analysis, we demonstrate a fundamental…
An epsilon-near-zero-based Dallenbach absorber
Viacheslav V. Medvedev
We report a theoretical analysis of total absorption conditions in a structure consisting of a lossy coating layer on top of a specular metal substrate, which is known as a Dallenb…
Miniature Plasma Source for In-Situ Scanner Cleaning
Mark van de Kerkhof, Edgar Osorio, Vladimir Krivtsun +3
EUV Lithography is the technology of choice for High-Volume Manufacturing (HVM) of sub-10nm lithography. One of the challenges is to enable in-situ cleaning of functional surfaces…
Expansion and fragmentation of liquid metal droplet by a short laser pulse
S. Yu. Grigoryev, B. V. Lakatosh, M. S. Krivokorytov +11
We report an experimental and numerical investigation of the fragmentation mechanisms of micrometer-sized metal droplet irradiated by ultrashort laser pulses. The results of the ex…
Droplet deformation and fragmentation by ultra-short laser pulses
M. S. Krivokorytov, A. Yu. Vinokhodov, Yu. V. Sidelnikov +5
We report on the experimental studies of the deformation and fragmentation of liquid metal droplets by picosecond and subpicosecond laser pulses. The experiments were performed wit…
Characterization of carbon contamination under ion and hot atom bombardment in a tin-plasma extreme ultraviolet light source
A Dolgov, D Lopaev, C J Lee +4
Molecular contamination of a grazing incidence collector for extreme ultraviolet (EUV) lithography was experimentally studied. A carbon film was found to have grown under irradiati…