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physics.plasm-ph2021
Miniature Plasma Source for In-Situ Scanner Cleaning
Mark van de Kerkhof, Edgar Osorio, Vladimir Krivtsun +3
EUV Lithography is the technology of choice for High-Volume Manufacturing (HVM) of sub-10nm lithography. One of the challenges is to enable in-situ cleaning of functional surfaces…
physics.plasm-ph2016
Droplet deformation and fragmentation by ultra-short laser pulses
M. S. Krivokorytov, A. Yu. Vinokhodov, Yu. V. Sidelnikov +5
We report on the experimental studies of the deformation and fragmentation of liquid metal droplets by picosecond and subpicosecond laser pulses. The experiments were performed wit…