236 citations · 294 across the 6 of their papers we have counts for
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physics.optics2021★ 11 cited
An epsilon-near-zero-based Dallenbach absorber
Viacheslav V. Medvedev
We report a theoretical analysis of total absorption conditions in a structure consisting of a lossy coating layer on top of a specular metal substrate, which is known as a Dallenb…
physics.plasm-ph2021
Miniature Plasma Source for In-Situ Scanner Cleaning
Mark van de Kerkhof, Edgar Osorio, Vladimir Krivtsun +3
EUV Lithography is the technology of choice for High-Volume Manufacturing (HVM) of sub-10nm lithography. One of the challenges is to enable in-situ cleaning of functional surfaces…