223 citations · 309 across the 3 of their papers we have counts for
3 papers
Finite Size Effects in Highly Scaled Ruthenium Interconnects
Shibesh Dutta, Kristof Moors, Michiel Vandemaele +1
Ru has been considered a candidate to replace Cu-based interconnects in VLSI circuits. Here, a methodology is proposed to predict the resistivity of (Ru) interconnects. First, the…
Resistivity scaling model for metals with conduction band anisotropy
Miguel De Clercq, Kristof Moors, Kiroubanand Sankaran +5
It is generally understood that the resistivity of metal thin films scales with film thickness mainly due to grain boundary and boundary surface scattering. Recently, several exper…
Thickness dependence of the resistivity of Platinum group metal thin films
Shibesh Dutta, Kiroubanand Sankaran, Kristof Moors +6
We report on the thin film resistivity of several platinum-group metals (Ru, Pd, Ir, Pt). Platinum-group thin films show comparable or lower resistivities than Cu for film thicknes…