3 papers
cond-mat.mtrl-sci2018
Finite Size Effects in Highly Scaled Ruthenium Interconnects
Shibesh Dutta, Kristof Moors, Michiel Vandemaele +1
Ru has been considered a candidate to replace Cu-based interconnects in VLSI circuits. Here, a methodology is proposed to predict the resistivity of (Ru) interconnects. First, the…
cond-mat.mes-hall2017
Resistivity scaling model for metals with conduction band anisotropy
Miguel De Clercq, Kristof Moors, Kiroubanand Sankaran +5
It is generally understood that the resistivity of metal thin films scales with film thickness mainly due to grain boundary and boundary surface scattering. Recently, several exper…
cond-mat.mtrl-sci2017
Thickness dependence of the resistivity of Platinum group metal thin films
Shibesh Dutta, Kiroubanand Sankaran, Kristof Moors +6
We report on the thin film resistivity of several platinum-group metals (Ru, Pd, Ir, Pt). Platinum-group thin films show comparable or lower resistivities than Cu for film thicknes…