30 citations · 65 across the 9 of their papers we have counts for
9 papers
Particle charging during pulsed EUV exposures with afterglow effect
M. Chaudhuri, L. C. J. Heijmans, M. van de Kerkhof +3
The nanoparticle charging processes along with background spatial-temporal plasma profile have been investigated with 3DPIC simulation in a pulsed EUV exposure environment. It is f…
Dynamics of H atoms surface recombination in low-temperature plasma
V. Gubarev, D. Lopayev, A. Zotovich +5
The dynamics of H atom recombination on materials of interest for a EUV lithographer was studied under a longterm low-pressure H2 plasma exposure. The similarity of the experimenta…
Miniature Plasma Source for In-Situ Scanner Cleaning
Mark van de Kerkhof, Edgar Osorio, Vladimir Krivtsun +3
EUV Lithography is the technology of choice for High-Volume Manufacturing (HVM) of sub-10nm lithography. One of the challenges is to enable in-situ cleaning of functional surfaces…
EUV-induced Hydrogen Plasma : Pulsed Mode Operation and Confinement in Scanner
Mark van de Kerkhof, Andrei M. Yakunin, Dmitry Astakhov +3
In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. Thi…
Particle lofting from substrate exposed to plasma and electron beam
P. V. Krainov, V. V. Ivanov, D. I. Astakhov +4
A nanometer-sized dielectric particle lying on a dielectric substrate is exposed to the flux of low-energy electrons, ion and electron fluxes from a cold plasma and the fluxes from…
Dielectric particle lofting from dielectric substrate exposed to low energy electron beam
P. V. Krainov, V. V. Ivanov, D. I. Astakhov +4
The particle-in-cell simulation is applied to study a nanometer-sized dielectric particle lofting from a dielectric substrate exposed to a low energy electron beam. The article dis…