30 citations · 65 across the 9 of their papers we have counts for
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physics.plasm-ph2021
Miniature Plasma Source for In-Situ Scanner Cleaning
Mark van de Kerkhof, Edgar Osorio, Vladimir Krivtsun +3
EUV Lithography is the technology of choice for High-Volume Manufacturing (HVM) of sub-10nm lithography. One of the challenges is to enable in-situ cleaning of functional surfaces…
physics.plasm-ph2021
EUV-induced Hydrogen Plasma : Pulsed Mode Operation and Confinement in Scanner
Mark van de Kerkhof, Andrei M. Yakunin, Dmitry Astakhov +3
In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. Thi…