57 citations · 128 across the 6 of their papers we have counts for
1 paper · 1 filter
Thomas Proslier, Jeffrey A. Klug, Jeffrey W. Elam +3
Atomic layer deposition was used to synthesize niobium silicide (NbSi) films with a 1:1 stoichiometry, using NbF5 and Si2H6 as precursors. The growth mechanism at 200oC was examine…