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J. Klug

9 papers hereh-index 15690 citations51 works total

Matching runs newest-first, so older work may not be attached to this profile yet.

author position
  • middle author6

Across the 6 of 9 papers where every author was matched, so the position is known.

fields
  • cond-mat.mtrl-sci3
  • cond-mat.supr-con2
  • eess.IV2
  • cond-mat.other1
  • physics.optics1
same name
  • J. Klug — 11 papers, h 16
  • J. Klug — 1 paper, h 6

Either other researchers who publish under this name, or the same person where the external sources have not merged their records.

identity via Semantic Scholar / OpenAlex

activity
20082025
most citedSpin-Charge-Lattice Coupling through Resonant Multi-Magnon Excitations in Multiferroic BiFeO3

53 citations · 146 across the 8 of their papers we have counts for

collaborators
Showing cond-mat.mtrl-sciShow all

3 papers · 1 filter

cond-mat.mtrl-sci2013★ 15 cited

Heteroepitaxy of Group IV-VI Nitrides by Atomic Layer Deposition

Jeffrey A. Klug, Nicholas G. Becker, Nickolas R. Groll +5

Heteroepitaxial growth of selected group IV-VI nitrides on various orientations of sapphire (α-Al2O3) is demonstrated using atomic layer deposition. High quality, epitaxial films a…

cond-mat.mtrl-sci2012★ 12 cited

Measuring roughness of buried interfaces by sputter depth profiling

S. V. Baryshev, J. A. Klug, A. V. Zinovev +3

In this communication, we report results of a high resolution sputter depth profiling analysis of a stack of 16 alternating MgO and ZnO nanolayers grown by atomic layer deposition…

cond-mat.mtrl-sci2011

Atomic layer deposition and superconducting properties of NbSi films

Thomas Proslier, Jeffrey A. Klug, Jeffrey W. Elam +3

Atomic layer deposition was used to synthesize niobium silicide (NbSi) films with a 1:1 stoichiometry, using NbF5 and Si2H6 as precursors. The growth mechanism at 200oC was examine…

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