most citedIntrinsic and dopant enhanced solid phase epitaxy in amorphous germanium

53 citations · 131 across the 5 of their papers we have counts for

collaborators
Showing cond-mat.mtrl-sciShow all

5 papers · 1 filter

cond-mat.mtrl-sci20121 cited

Efficiently Engineered Room Temperature Single Photons in Silicon Carbide

S. Castelletto, B. C. Johnson, N. Stavrias +2

We report the first observation of stable single photon sources in silicon carbide (SiC). These sources are extremely bright and operate at room temperature demonstrating that SiC…

cond-mat.mtrl-sci201039 cited

Dopant-enhanced solid phase epitaxy in buried amorphous silicon layers

B. C. Johnson, J. C. McCallum

The kinetics of intrinsic and dopant-enhanced solid phase epitaxy (SPE) are stud- ied in buried amorphous Si (a-Si) layers in which SPE is not retarded by H. As, P, B and Al profil…

cond-mat.mtrl-sci201053 cited

Intrinsic and dopant enhanced solid phase epitaxy in amorphous germanium

B. C. Johnson, P. Gortmaker, J. C. McCallum

The kinetics of intrinsic and dopant-enhanced solid phase epitaxy (SPE) is stud- ied in amorphous germanium (a-Ge) layers formed by ion implantation on <100> Ge substrates. The SPE…

cond-mat.mtrl-sci201027 cited

Drain current modulation in a nanoscale field-effect-transistor channel by single dopant implantation

B. C. Johnson, G. C. Tettamanzi, A. D. C. Alves +9

We demonstrate single dopant implantation into the channel of a silicon nanoscale metal-oxide-semiconductor field-effect-transistor. This is achieved by monitoring the drain curren…

cond-mat.mtrl-sci20108 cited

Deep level transient spectroscopy study for the development of ion-implanted silicon field-effect transistors for spin-dependent transport

B. C. Johnson, J. C. McCallum, L. H. Willems van Beveren +1

A deep level transient spectroscopy (DLTS) study of defects created by low-fluence, low-energy ion implantation for development of ion-implanted silicon field-effect transistors fo…