4 papers
Plasma sheath tailoring by a magnetic field for three-dimensional plasma etching
E. Jüngling, S. Wilczek, T. Mussenbrock +2
Three-dimensional (3D) etching of materials by plasmas is an ultimate challenge in microstructuring applications. A method is proposed to reach a controllable 3D structure by using…
PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth
Teresa de los Arcos, Peter Awakowicz, Jan Benedikt +17
This feature article considers the analysis of the initial states of film growth on polymer substrates. The assembled results are based on the cooperation between research groups i…
Azimuthal ion movement in HiPIMS plasmas -- Part II: lateral growth fluxes
Steffen Schüttler, Sascha Thiemann-Monje, Julian Held +1
The transport of sputtered species from the target of a magnetron plasma to a collecting surface at the circumference of the plasma is analyzed using a particle tracer technique. A…
Azimuthal ion movement in HiPIMS plasmas -- Part I: velocity distribution function
S. Thiemann-Monjé, J. Held, S. Schüttler +2
Magnetron sputtering discharges feature complex magnetic field configurations to confine the electrons close to the cathode surface. This magnetic field configuration gives rise to…