214 citations · 334 across the 13 of their papers we have counts for
13 papers
Plasma sheath tailoring by a magnetic field for three-dimensional plasma etching
E. Jüngling, S. Wilczek, T. Mussenbrock +2
Three-dimensional (3D) etching of materials by plasmas is an ultimate challenge in microstructuring applications. A method is proposed to reach a controllable 3D structure by using…
PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth
Teresa de los Arcos, Peter Awakowicz, Jan Benedikt +17
This feature article considers the analysis of the initial states of film growth on polymer substrates. The assembled results are based on the cooperation between research groups i…
Azimuthal ion movement in HiPIMS plasmas -- Part II: lateral growth fluxes
Steffen Schüttler, Sascha Thiemann-Monje, Julian Held +1
The transport of sputtered species from the target of a magnetron plasma to a collecting surface at the circumference of the plasma is analyzed using a particle tracer technique. A…
Azimuthal ion movement in HiPIMS plasmas -- Part I: velocity distribution function
S. Thiemann-Monjé, J. Held, S. Schüttler +2
Magnetron sputtering discharges feature complex magnetic field configurations to confine the electrons close to the cathode surface. This magnetic field configuration gives rise to…
Scaling and laws of DC discharges as pointers for HiPIMS plasmas
Christian Maszl, Johann Laimer, Achim von Keudell +1
Scaling or smiliarity laws of plasmas are of interest if lab size plasma sources are to be scaled for industrial processes. Ideally, the discharge parameters of the scaled plasmas…
Fast time resolved techniques as key to the understanding of energy and particle transport in HPPMS-plasmas
Christian Maszl, Wolfgang Breilmann, Lars Berscheid +2
High power pulsed magnetron sputtering (HPPMS) plasmas are pulsed discharges where the plasma composition as well as the fluxes and energies of ions are changing during the pulse.…
Origin of the energetic ions at the substrate generated during high power pulsed magnetron sputtering of titanium
Christian Maszl, Wolfgang Breilmann, Jan Benedikt +1
HiPIMS plasmas generate energetic metal ions at the substrate as a major difference to conventional direct current magnetron sputtering. The origin of these ions is still an open i…
Particle beam experiments for the investigation of plasma-surface interactions: application to magnetron sputtering and polymer treatment
Carles Corbella, Simon Grosse-Kreul, Oliver Kreiter +3
A beam experiment is presented to study heterogeneous reactions relevant to plasma-surface interactions. Atom and ion beams are focused onto the sample to expose it to quantified b…
Time resolved measurement of film growth during reactive high power pulsed magnetron sputtering (HIPIMS) of titanium nitride
Felix Mitschker, Marina Prenzel, Jan Benedikt +2
The growth rate during reactive high power pulsed magnetron sputtering (HIPIMS) of titanium nitride is measured with a temporal resolution of up to 25 us using a rotating shutter c…
Bimodal substrate biasing to control γ-Al2O3 deposition during reactive magnetron sputtering
Marina Prenzel, Annika Kortmann, Adrian Stein +3
Al2O3 thin films have been deposited at substrate temperatures between 500°C to 600°C by reactive magnetron sputtering using an additional arbitrary substrate bias to tailor the en…
The mystery of O and O3 production in the effluent of a He/O2 atmospheric pressure microplasma jet
Dirk Ellerweg, Achim von Keudell, Jan Benedikt
Microplasma jets are commonly used to treat samples in ambient air atmosphere. The effect of admixing air into the effluent may severely affect the composition of the emerging spec…
The role of oxygen and surface reactions in the deposition of silicon oxide like films from HMDSO at atmospheric pressure
R. Reuter, K. Rügner, D. Ellerweg +3
The deposition of thin SiOCH or SiOH films by means of atmospheric pressure microplasma jets with admixture of Hexamethyldisiloxane (HMDSO) and oxygen and the r…
Thermal conductivity of amorphous carbon thin films
Andrew J. Bullen, Keith E. O'Hara, David G. Cahill +2
Thermal conductivities of amorphous carbon thin films are measured in the temperatures range 80--400 K using the method. Sample films range from soft a-C:H prepared by rem…