activity
20002023
most citedThermal conductivity of amorphous carbon thin films

214 citations · 334 across the 13 of their papers we have counts for

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Showing 2013Show all

4 papers · 1 filter

physics.plasm-ph2013★ 95 cited

Origin of the energetic ions at the substrate generated during high power pulsed magnetron sputtering of titanium

Christian Maszl, Wolfgang Breilmann, Jan Benedikt +1

HiPIMS plasmas generate energetic metal ions at the substrate as a major difference to conventional direct current magnetron sputtering. The origin of these ions is still an open i…

physics.plasm-ph2013

Particle beam experiments for the investigation of plasma-surface interactions: application to magnetron sputtering and polymer treatment

Carles Corbella, Simon Grosse-Kreul, Oliver Kreiter +3

A beam experiment is presented to study heterogeneous reactions relevant to plasma-surface interactions. Atom and ion beams are focused onto the sample to expose it to quantified b…

physics.plasm-ph2013★ 5 cited

Time resolved measurement of film growth during reactive high power pulsed magnetron sputtering (HIPIMS) of titanium nitride

Felix Mitschker, Marina Prenzel, Jan Benedikt +2

The growth rate during reactive high power pulsed magnetron sputtering (HIPIMS) of titanium nitride is measured with a temporal resolution of up to 25 us using a rotating shutter c…

physics.plasm-ph2013★ 16 cited

Bimodal substrate biasing to control γ-Al2O3 deposition during reactive magnetron sputtering

Marina Prenzel, Annika Kortmann, Adrian Stein +3

Al2O3 thin films have been deposited at substrate temperatures between 500°C to 600°C by reactive magnetron sputtering using an additional arbitrary substrate bias to tailor the en…