most citedAnomalous thermal oxidation of gadolinium thin films deposited on silicon by high pressure sputtering

12 citations · 56 across the 7 of their papers we have counts for

collaborators

7 papers

cond-mat.mtrl-sci202410 cited

Electrical characterization of gadolinium oxide deposited by high pressure sputtering with in situ plasma oxidation

María Ángela Pampillón, Pedro Carlos Feijoo, Enrique San Andrés

In this work, we characterized gadolinium oxide films deposited on silicon by high pressure sputtering with a two-step process: first, we sputtered metallic gadolinium in an argon…

cond-mat.mtrl-sci202412 cited

Anomalous thermal oxidation of gadolinium thin films deposited on silicon by high pressure sputtering

María Ángela Pampillón, Pedro Carlos Feijoo, Enrique San Andrés +2

Thin gadolinium metallic layers were deposited by high-pressure sputtering in pure Ar atmosphere. Subsequently, in situ thermal oxidation was performed at temperatures ranging from…

cond-mat.mtrl-sci20246 cited

Gadolinium scandate by high-pressure sputtering for future generations of high-k dielectrics

Pedro Carlos Feijoo, María Ángela Pampillón, Enrique San Andrés +1

Gd-rich gadolinium scandate (Gd2-xScxO3) was deposited by high-pressure sputtering on (100) silicon by alternating the deposition of lower than 0.5 nm thick films of its binary com…

cond-mat.mtrl-sci20246 cited

Scavenging effect on plasma oxidized GdO grown by high pressure sputtering on Si and InP substrates

María Ángela Pampillón, Pedro Carlos Feijoo, Enrique San Andrés +3

In this work, we analyze the scavenging effect of titanium gates on metal insulator semiconductor capacitors composed of gadolinium oxide as dielectric material deposited on Si and…

cond-mat.mtrl-sci20248 cited

High-k gadolinium scandate on Si obtained by high pressure sputtering from metal targets and in-situ plasma oxidation

María Ángela Pampillón, Enrique San Andrés, Pedro Carlos Feijoo +1

This article studies the physical and electrical behavior of Gd2-xScxO3 layers grown by high pressure sputtering from metallic Gd and Sc targets. The aim is to obtain a high permit…

physics.app-ph20242 cited

High Pressure Sputtering For Kigh-k Dielectric Deposition. Is It Worth Trying?

Enrique San Andrés, Pedro Carlos Feijoo, María Ángela Pampillón +2

Our research group studies the deposition of high permittivity dielectrics by a non-standard method: high-pressure sputtering. The dielectrics studied here are gadolinium scandate…