activity
20042026
most citedA universal description of III-V/Si epitaxial growth processes

60 citations · 117 across the 4 of their papers we have counts for

collaborators

5 papers

cond-mat.mtrl-sci2026

III-V antiphase boundaries are not generated by Si or Ge substrate step edges

Charles Cornet, Sreejith Pallikkara Chandrasekharan, Audrey Gilbert +7

We critically review recent experimental and theoretical advances on the valence- and structure-mismatched heteroepitaxy of III-V semiconductors on group-IV substrates. We examine…

cond-mat.mtrl-sci2026

Unlocking extreme doping and strain in epitaxial monocrystalline silicon

Léonard Desvignes, Dominique Débarre, Ludovic Largeau +8

Hyperdoping, overcoming the solubility limit of dopants in a crystalline semiconductor, is a fertile method for the enhancement of the electrical, structural and optical devices' p…

cond-mat.mtrl-sci2025

Full ab initio atomistic approach for morphology prediction of hetero-integrated crystals: A confrontation with experiments

Sreejith Pallikkara Chandrasekharan, Sofia Apergi, Chen Wei +6

Here, we propose a comprehensive first-principle atomistic approach to predict the Wulff-Kaischew equilibrium shape of crystals heterogeneously integrated on a dissimilar material.…

cond-mat.mtrl-sci2018★ 60 cited

A universal description of III-V/Si epitaxial growth processes

I. Lucci, S. Charbonnier, L. Pedesseau +15

Here, we experimentally and theoretically clarify III-V/Si crystal growth processes. Atomically-resolved microscopy shows that mono-domain 3D islands are observed at the early stag…

cond-mat.mtrl-sci2004★ 57 cited

Determination of the local concentrations of Mn interstitials and antisite defects in GaMnAs

F. Glas, G. Patriarche, L. Largeau +1

We present a method for the determination of the local concentrations of interstitial and substitutional Mn atoms and As antisite defects in GaMnAs. The method relies on the sensit…