93 citations · 217 across the 9 of their papers we have counts for
9 papers
Programmable activation of quantum emitters in high-purity silicon with focused carbon ion beams
M. Hollenbach, N. Klingner, P. Mazarov +8
Carbon implantation at the nanoscale is highly desired for the engineering of defect-based qubits in a variety of materials, including silicon, diamond, SiC and hBN. However, the l…
Roadmap for focused ion beam technologies
Katja Höflich, Gerhard Hobler, Frances I. Allen +29
The focused ion beam (FIB) is a powerful tool for the fabrication, modification and characterization of materials down to the nanoscale. Starting with the gallium FIB, which was or…
Wafer-scale nanofabrication of telecom single-photon emitters in silicon
M. Hollenbach, N. Klingner, N. S. Jagtap +9
A highly promising route to scale millions of qubits is to use quantum photonic integrated circuits (PICs), where deterministic photon sources, reconfigurable optical elements, and…
Probing ultrafast laser plasma processes inside solids with resonant small-angle X-ray scattering
Lennart Gaus, Lothar Bischoff, Michael Bussmann +33
Extreme states of matter exist throughout the universe e.g. inside planetary cores, stars or astrophysical jets. Such conditions are generated in the laboratory in the interaction…
Boron Liquid Metal Alloy Ion Sources For Special FIB Applications
Lothar Bischoff, Nico Klingner, Paul Mazarov +2
Focused Ion Beam (FIB) processing has been established as a well-suited and promising technique in R&D in nearly all fields of nanotechnology for patterning and prototyping on the…
Site-controlled formation of single Si nanocrystals in a buried SiO2 matrix using ion beam mixing
Xiaomo Xu, Thomas Prüfer, Daniel Wolf +8
For future nanoelectronic devices - such as room-temperature single electron transistors - the site-controlled formation of single Si nanocrystals (NCs) is a crucial prerequisite.…