60 citations · 238 across the 18 of their papers we have counts for
Showing 2011Show all
2 papers · 1 filter
cond-mat.mtrl-sci2011★ 10 cited
Noncontact electrical metrology of Cu/low-k interconnect for semiconductor production wafers
V. V. Talanov, A. Scherz, A. R. Schwartz
We have demonstrated a technique capable of in-line measurement of dielectric constant of low-k interconnect films on patterned wafers utilizing a test key of ~50x50 μm in size. Th…
cond-mat.mtrl-sci2011★ 32 cited
Noncontact dielectric constant metrology of low-k interconnect films using a near-field scanned microwave probe
Vladimir V. Talanov, André Scherz, Robert L. Moreland +1
We present a method for noncontact, noninvasive measurements of dielectric constant, k, of 100-nm- to 1.5-μm-thick blanket low-k interconnect films on up to 300 mm in diameter wafe…