117 citations · 290 across the 12 of their papers we have counts for
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Near-field scanning microwave microscope for interline capacitance characterization of nanoelectronics interconnect
Vladimir V. Talanov, Andrew R. Schwartz
We have developed a noncontact method for measurement of the interline capacitance in Cu/low-k interconnect. It is based on a miniature test vehicle with net capacitance of a few f…
Noncontact electrical metrology of Cu/low-k interconnect for semiconductor production wafers
V. V. Talanov, A. Scherz, A. R. Schwartz
We have demonstrated a technique capable of in-line measurement of dielectric constant of low-k interconnect films on patterned wafers utilizing a test key of ~50x50 μm in size. Th…
Noncontact dielectric constant metrology of low-k interconnect films using a near-field scanned microwave probe
Vladimir V. Talanov, André Scherz, Robert L. Moreland +1
We present a method for noncontact, noninvasive measurements of dielectric constant, k, of 100-nm- to 1.5-μm-thick blanket low-k interconnect films on up to 300 mm in diameter wafe…
A near-field scanned microwave probe for spatially localized electrical metrology
Vladimir V. Talanov, Andre Scherz, Robert L. Moreland +1
We have developed a near-field scanned microwave probe with a sampling volume of approximately 10 micron in diameter, which is the smallest one achieved in near-field microwave mic…