94 citations · 328 across the 11 of their papers we have counts for
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cond-mat.mtrl-sci2021
Spatially-Modulated Silicon Interface Energetics via Hydrogen Plasma-Assisted Atomic Layer Deposition of Ultrathin Alumina
Alex Henning, Johannes D. Bartl, Lukas Wolz +12
Atomic layer deposition (ALD) is a key technique for the continued scaling of semiconductor devices, which increasingly relies on reproducible and scalable processes for interface…
cond-mat.mtrl-sci2021
Aluminum Oxide at the Monolayer Limit via Oxidant-free Plasma-Assisted Atomic Layer Deposition on GaN
Alex Henning, Johannes D. Bartl, Andreas Zeidler +7
Atomic layer deposition (ALD) is an essential tool in semiconductor device fabrication that allows the growth of ultrathin and conformal films to precisely form heterostructures an…