activity
20062015
most citedHigh-field Hall resistivity and magnetoresistance in electron-doped Pr_2-xCe_xCuO_{4-δ}

62 citations · 161 across the 7 of their papers we have counts for

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cond-mat.mes-hall2015★ 6 cited

A Review of Proximity Effect Correction in Electron-beam Lithography

Pengcheng Li

I review the work of proximity effect correction (PEC) in electron-beam (e-beam) lithography with emphasis on dose modification and shape modification PEC techniques.

cond-mat.mtrl-sci2015

Optimization of Spatial Dose Distribution for Controlling Sidewall Shape in Electron-beam Lithography

Pengcheng Li

Electron-beam (e-beam) lithography is widely employed in fabrication of 2-D patterns and 3-D structures. A certain type or shape of the sidewall in the remaining resist profile may…