62 citations · 161 across the 7 of their papers we have counts for
7 papers
A Review of Proximity Effect Correction in Electron-beam Lithography
Pengcheng Li
I review the work of proximity effect correction (PEC) in electron-beam (e-beam) lithography with emphasis on dose modification and shape modification PEC techniques.
Optimization of Spatial Dose Distribution for Controlling Sidewall Shape in Electron-beam Lithography
Pengcheng Li
Electron-beam (e-beam) lithography is widely employed in fabrication of 2-D patterns and 3-D structures. A certain type or shape of the sidewall in the remaining resist profile may…
Normal State Nernst Effect in Electron-doped Pr2-xCexCuO4: Superconducting Fluctuations and Two-band Transport
Pengcheng Li, R. L. Greene
We report a systematic study of normal state Nernst effect in the electron-doped cuprates PrCeCuO over a wide range of doping (0.050.21) and temper…
Upper critical field of electron-doped PrCeCuO in parallel magnetic fields
Pengcheng Li, F. F. Balakirev, R. L. Greene
We report a systematic study of the resistive superconducting transition in the electron-doped cuprates PrCeCuO down to 1.5 K for magnetic field up to 58 T ap…
Correlation between incoherent phase fluctuations and disorder in YPrBaCuO epitaxial films from Nernst effect measurements
Pengcheng Li, Soumen Mandal, R. C. Budhani +1
Measurements of Nernst effect, resistivity and Hall angle on epitaxial films of YPrBaCuO(Pr-YBCO, 00.4) are reported over a broad range of t…
High-field Hall resistivity and magnetoresistance in electron-doped Pr_2-xCe_xCuO_{4-δ}
Pengcheng Li, F. F. Balakirev, R. L. Greene
We report resistivity and Hall effect measurements in electron-doped PrCeCuO films in magnetic field up to 58 T. In contrast to hole-doped cuprates, we find a…