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20242026
most citedCryogenic Characterization of Ferroelectric Non-volatile Capacitors

1 citations · 2 across the 11 of their papers we have counts for

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8 papers · 1 filter

cond-mat.mtrl-sci2026★ 1 cited

Experiments and Modeling of Defect Dynamics and BTI Behavior in Doped InO TFTs during C Post-Processing Forming Gas Annealing

Yu-Hsin Kuo, Chengyang Zhang, Priyankka Ravikumar +13

We investigate the impact of a monolithic three-dimensional (M3D) integration process-critical C post-processing forming gas anneal (FGA) on the electrical performance,…

cond-mat.mtrl-sci2026

Thermal Processing Limits in Oxide-Channel Ferroelectric Field Effect Transistors

Lance Fernandes, Yu-Hsin Kuo, Chengyang Zhang +15

In this work, we report a systematic study of the impact of high-temperature post-capping thermal annealing on the memory characteristics of Oxide-semiconductor channel ferroelectr…

cond-mat.mtrl-sci2026

ALD Oxidant as A Tuning Knob for Memory Window Expansion in Ferroelectric FETs for Vertical NAND Applications

Ranie Jeyakumar, Prasanna Venkatesan, Lance Fernandes +12

Dielectric inserts are widely used to expand the memory window (MW) in ferroelectric FETs (FeFETs) for vertical NAND applications, with prior efforts focused primarily on material…

cond-mat.mtrl-sci2026

The First Switch Effect in Ferroelectric Field-Effect Transistors

Priyankka Ravikumar, Prasanna Venkatesan, Chinsung Park +7

In this work, a ferroelectric field-effect transistor (FEFET) is systematically characterized and compared with an equivalent standard MOSFET with an equivalent oxide thickness. We…

cond-mat.mtrl-sci2026

ALD-Derived WO3-x Leads to Nearly Wake-Up-Free Ferroelectric Hf0.5Zr0.5O2 at Elevated Temperatures

Nashrah Afroze, Jihoon Choi, Salma Soliman +10

Breaking the memory wall in advanced computing architectures will require complex 3D integration of emerging memory materials such as ferroelectrics-either within the back-end-of-l…

cond-mat.mtrl-sci2025

Pulse-Mode Operation and Reliability of BEOL-Compatible Ferroelectric Non-Volatile Capacitive Memories with Amorphous Oxide Semiconductor Channels

Junmo Lee, Chengyang Zhang, Tae-Hyeon Kim +2

Non-volatile capacitive memories (nvCAPs) exhibiting AC small-signal capacitance on/off ratio (Con/Coff) with non-destructive read have emerged as a promising device for next-gener…

cond-mat.mtrl-sci2025

Revealing Phonon Bridge Effect for Amorphous vs Crystalline Metal-Silicide Layers at Si/Ti Interfaces by a Machine Learning Potential

Mayur Singh, Lokanath Patra, Chengyang Zhang +4

Metal-semiconductor interfaces play a central role in micro and nano-electronic devices as heat dissipation or temperature drop across these interfaces can significantly affect dev…

cond-mat.mtrl-sci2024

Direct imaging of asymmetric interfaces and electrostatic potentials inside a hafnia-zirconia ferroelectric nanocapacitor

Daniel B Durham, Manifa Noor, Khandker Akif Aabrar +5

In hafnia-based thin-film ferroelectric devices, chemical phenomena during growth and processing such as oxygen vacancy formation and interfacial reactions appear to strongly affec…