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cs.AI2026
Can AI Agents Really Complete RTL-to-GDS? Lessons from Benchmarking Tool-Interactive EDA Workflows
Jinyuan Deng, Zhengrui Chen, Xufeng Wei +4
Large language model (LLM) agents are extending electronic design automation (EDA) beyond static RTL generation toward long-horizon, tool-interactive workflows. Yet it remains uncl…
cs.AI2026
LithoDreamer: A Physics-Informed World Model for Multi-Stage Computational Lithography
Yuqi Jiang, Yumeng Liu, Zimu Li +7
As semiconductor technology nodes scale, computational lithography is essential for ensuring yield and performance. However, lithography is a continuous physical process involving…