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20242026
most citedFabGPT: An Efficient Large Multimodal Model for Complex Wafer Defect Knowledge Queries

18 citations · 25 across the 9 of their papers we have counts for

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8 papers · 1 filter

cs.LG2026

LLM-Augmented Bayesian Optimization with Adaptive Policies for Chiplet Design Space Exploration

Hang Liu, Zhengfei Chen, Zhengrui Chen +3

Chiplet technology is a key approach for extending Moore's Law. However, its design process is constrained by two primary challenges: the scarcity of early-stage platforms for rapi…

astro-ph.CO2026

Scalar Perturbations and Induced Gravitational Waves from First-Order Phase Transitions in Lattice Simulations

Yuan-Jie Li, Jing Liu, Zhuan Ning +3

Cosmological first-order phase transitions can generate curvature perturbations through inhomogeneous quantum tunneling, as studied previously on superhorizon scales. In this work,…

cs.AR2026

WaveletECO: A Closed-Loop Physical ECO Platform and a Specialized Local Language Model

Guoxiang Xu, Guozhen Ji, Zijian Luo +3

Engineering change order (ECO) is an important step in repairing timing and electrical violations during the late stages of chip design. Existing Agentic EDA methods primarily focu…

cs.LG2026

RODE: A Radial-Orthogonal Decoupled Engine for Optimization

Guoxiang Xu, Bince Qu, Qi Sun +1

Modern neural network training increasingly uses matrix-aware optimizers, yet their conditioned matrix step is typically added directly to the weight, jointly changing its norm and…

cs.AI2026

Can AI Agents Really Complete RTL-to-GDS? Lessons from Benchmarking Tool-Interactive EDA Workflows

Jinyuan Deng, Zhengrui Chen, Xufeng Wei +4

Large language model (LLM) agents are extending electronic design automation (EDA) beyond static RTL generation toward long-horizon, tool-interactive workflows. Yet it remains uncl…

cs.AI2026

LithoDreamer: A Physics-Informed World Model for Multi-Stage Computational Lithography

Yuqi Jiang, Yumeng Liu, Zimu Li +7

As semiconductor technology nodes scale, computational lithography is essential for ensuring yield and performance. However, lithography is a continuous physical process involving…

cs.RO2026

ScoRe-Flow: Complete Distributional Control via Score-Based Reinforcement Learning for Flow Matching

Xiaotian Qiu, Lukai Chen, Jinhao Li +3

Flow Matching (FM) policies have emerged as an efficient backbone for robotic control, offering fast and expressive action generation that underpins recent large-scale embodied AI…

cs.AR2026

FluxEDA: A Unified Execution Infrastructure for Stateful Agentic EDA

Zhengrui Chen, Zixuan Song, Yu Li +2

Large language models and autonomous agents are increasingly explored for EDA automation, but many existing integrations still rely on script-level or request-level interactions, w…