3 citations · 3 across the 2 of their papers we have counts for
2 papers
cs.LG2022★ 3 cited
Large Scale Mask Optimization Via Convolutional Fourier Neural Operator and Litho-Guided Self Training
Haoyu Yang, Zongyi Li, Kumara Sastry +5
Machine learning techniques have been extensively studied for mask optimization problems, aiming at better mask printability, shorter turnaround time, better mask manufacturability…
cs.OH2022
Generic Lithography Modeling with Dual-band Optics-Inspired Neural Networks
Haoyu Yang, Zongyi Li, Kumara Sastry +6
Lithography simulation is a critical step in VLSI design and optimization for manufacturability. Existing solutions for highly accurate lithography simulation with rigorous models…