Enchanced reflectance SiN${}_x$ / SiO${}_x$ DBR mirror based on TEOS precursor fabricated by PECVD method

I. M. Asharchuk, M. V. Shibalov, A. M. Mumlyakov +6

In this study, we investigated the influence of silicon oxide roughness produced from the gas precursor monosilane (SiH${}_4$) and the silicon-organic precursor tetraethoxysilane (TE…