Enchanced reflectance SiN${}_x$ / SiO${}_x$ DBR mirror based on TEOS precursor fabricated by PECVD method

Abstract

In this study, we investigated the influence of silicon oxide roughness produced from the gas precursor monosilane (SiH${}_4$) and the silicon-organic precursor tetraethoxysilane (TEOS) on the optical qualities of a distributed Bragg reflector (DBR). A significant influence of the precursors from which SiOx is deposited on the optical qualities of DBR mirrors is demonstrated in this study. It has been shown experimentally that a mirror produced from the TEOS precursor is endowed with better qualities than a mirror produced using SiH4, that is, the reflectivity increased by 20% and optical losses decreased by half. The roughness average (Ra) of the SiN${}_x$/SiO${}_x$ / (TEOS) mirror surface decreased by a factor of five compared to that of the SiN${}_x$/SiO${}_x$ / (SiH4) mirror