31 citations · 81 across the 14 of their papers we have counts for
4 papers · 1 filter
CAMO: Correlation-Aware Mask Optimization with Modulated Reinforcement Learning
Xiaoxiao Liang, Haoyu Yang, Kang Liu +2
Optical proximity correction (OPC) is a vital step to ensure printability in modern VLSI manufacturing. Various OPC approaches based on machine learning have been proposed to pursu…
Physics-Informed Optical Kernel Regression Using Complex-valued Neural Fields
Guojin Chen, Zehua Pei, Haoyu Yang +3
Lithography is fundamental to integrated circuit fabrication, necessitating large computation overhead. The advancement of machine learning (ML)-based lithography models alleviates…
DevelSet: Deep Neural Level Set for Instant Mask Optimization
Guojin Chen, Ziyang Yu, Hongduo Liu +2
With the feature size continuously shrinking in advanced technology nodes, mask optimization is increasingly crucial in the conventional design flow, accompanied by an explosive gr…
AdaOPC: A Self-Adaptive Mask Optimization Framework For Real Design Patterns
Wenqian Zhao, Xufeng Yao, Ziyang Yu +4
Optical proximity correction (OPC) is a widely-used resolution enhancement technique (RET) for printability optimization. Recently, rigorous numerical optimization and fast machine…