activity
20182024
most citedDAMO: Deep Agile Mask Optimization for Full Chip Scale

31 citations · 81 across the 14 of their papers we have counts for

collaborators

14 papers

cs.CV2024

CAMO: Correlation-Aware Mask Optimization with Modulated Reinforcement Learning

Xiaoxiao Liang, Haoyu Yang, Kang Liu +2

Optical proximity correction (OPC) is a vital step to ensure printability in modern VLSI manufacturing. Various OPC approaches based on machine learning have been proposed to pursu…

cs.CV2023★ 2 cited

Physics-Informed Optical Kernel Regression Using Complex-valued Neural Fields

Guojin Chen, Zehua Pei, Haoyu Yang +3

Lithography is fundamental to integrated circuit fabrication, necessitating large computation overhead. The advancement of machine learning (ML)-based lithography models alleviates…

cs.CV2023

DevelSet: Deep Neural Level Set for Instant Mask Optimization

Guojin Chen, Ziyang Yu, Hongduo Liu +2

With the feature size continuously shrinking in advanced technology nodes, mask optimization is increasingly crucial in the conventional design flow, accompanied by an explosive gr…

cs.CV2023★ 1 cited

AdaOPC: A Self-Adaptive Mask Optimization Framework For Real Design Patterns

Wenqian Zhao, Xufeng Yao, Ziyang Yu +4

Optical proximity correction (OPC) is a widely-used resolution enhancement technique (RET) for printability optimization. Recently, rigorous numerical optimization and fast machine…

cs.LG2023★ 3 cited

Adversarial Attacks on Adversarial Bandits

Yuzhe Ma, Zhijin Zhou

We study a security threat to adversarial multi-armed bandits, in which an attacker perturbs the loss or reward signal to control the behavior of the victim bandit player. We show…

cs.LG2022★ 6 cited

Rethinking Graph Neural Networks for the Graph Coloring Problem

Wei Li, Ruxuan Li, Yuzhe Ma +3

Graph coloring, a classical and critical NP-hard problem, is the problem of assigning connected nodes as different colors as possible. However, we observe that state-of-the-art GNN…

eess.SP2021★ 18 cited

Machine Learning for Electronic Design Automation: A Survey

Guyue Huang, Jingbo Hu, Yifan He +13

With the down-scaling of CMOS technology, the design complexity of very large-scale integrated (VLSI) is increasing. Although the application of machine learning (ML) techniques in…

cs.AR2020★ 31 cited

DAMO: Deep Agile Mask Optimization for Full Chip Scale

Guojin Chen, Wanli Chen, Yuzhe Ma +2

Continuous scaling of the VLSI system leaves a great challenge on manufacturing and optical proximity correction (OPC) is widely applied in conventional design flow for manufactura…

cs.LG2019

VLSI Mask Optimization: From Shallow To Deep Learning

Haoyu Yang, Wei Zhong, Yuzhe Ma +4

VLSI mask optimization is one of the most critical stages in manufacturability aware design, which is costly due to the complicated mask optimization and lithography simulation. Re…

cs.OH2019★ 5 cited

CAD Tool Design Space Exploration via Bayesian Optimization

Yuzhe Ma, Ziyang Yu, Bei Yu

The design complexity is increasing as the technology node keeps scaling down. As a result, the electronic design automation (EDA) tools also become more and more complex. There ar…

cs.LG2019★ 11 cited

Are Adversarial Perturbations a Showstopper for ML-Based CAD? A Case Study on CNN-Based Lithographic Hotspot Detection

Kang Liu, Haoyu Yang, Yuzhe Ma +5

There is substantial interest in the use of machine learning (ML) based techniques throughout the electronic computer-aided design (CAD) flow, particularly those based on deep lear…

cs.LG2018★ 2 cited

Recent Advances in Convolutional Neural Network Acceleration

Qianru Zhang, Meng Zhang, Tinghuan Chen +3

In recent years, convolutional neural networks (CNNs) have shown great performance in various fields such as image classification, pattern recognition, and multi-media compression.…

cs.LG2018★ 2 cited

A Unified Approximation Framework for Compressing and Accelerating Deep Neural Networks

Yuzhe Ma, Ran Chen, Wei Li +4

Deep neural networks (DNNs) have achieved significant success in a variety of real world applications, i.e., image classification. However, tons of parameters in the networks restr…

cs.AR2018

Cross-layer Optimization for High Speed Adders: A Pareto Driven Machine Learning Approach

Yuzhe Ma, Subhendu Roy, Jin Miao +2

In spite of maturity to the modern electronic design automation (EDA) tools, optimized designs at architectural stage may become sub-optimal after going through physical design flo…