128 citations · 295 across the 9 of their papers we have counts for
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Raffaella Lo Nigro, Emanuela Schilirò, Patrick Fiorenza +1
Nanolaminated Al2O3/HfO2 thin films as well as single Al2O3 and HfO2 layers have been grown as gate dielectrics by Plasma Enhanced Atomic Layer Deposition (PEALD) technique on sili…