Direct atomic layer deposition of ultrathin aluminium oxide on monolayer $Mo{S}_2$ exfoliated on gold: the role of the substrate

Emanuela Schilirò, Raffaella Lo Nigro, Salvatore E. Panasci +5

In this paper we demonstrated the thermal Atomic Layer Deposition (ALD) growth at 250 °C of highly homogeneous and ultra-thin ($\approx$ 3.6 nm) $A{l}_2{O}_3$ films with excellent insu…