20 citations · 24 across the 3 of their papers we have counts for
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physics.app-ph2021
Optical Near-Field Electron Microscopy
Raphaël Marchand, Radek Šachl, Martin Kalbáč +5
Imaging dynamical processes at interfaces and on the nanoscale is of great importance throughout science and technology. While light-optical imaging techniques often cannot provide…
physics.app-ph2019★ 1 cited
Patterning Sn-based EUV resists with low-energy electrons
Ivan Bespalov, Yu Zhang, Jarich Haitjema +5
Extreme Ultraviolet (EUV) lithography is the newest technology that will be used in the semiconductor industry for printing circuitry in the sub-20 nm scale. Low-energy electrons (…