A. Baczewski

activity

20202022

_{3}

for acceptor delta-doping of silicon

4 citations · 4 across the 2 of their papers we have counts for

collaborators

3 papers

cond-mat.mtrl-sci2022★ 4 cited

Reaction pathways of BCl $_{3}$ for acceptor delta-doping of silicon

Quinn Campbell, Kevin J. Dwyer, Sungha Baek +3

BCl $_{3}$ is a promising candidate for atomic-precision acceptor doping in Si, but optimizing the electrical properties of structures created with this technique requires a detailed…

cond-mat.mtrl-sci2021

AlCl $_{3}$ -dosed Si(100)-2 $\times$ 1: Adsorbates, chlorinated Al chains, and incorporated Al

Matthew S. Radue, Sungha Baek, Azadeh Farzaneh +8

The adsorption of AlCl $_{3}$ on Si(100) and the effect of annealing the AlCl $_{3}$ -dosed substrate was studied to reveal key surface processes for the development of atomic-precisi…

cond-mat.mtrl-sci2020

A model for atomic precision p-type doping with diborane on Si(100)-2 $\times$ 1

Quinn Campbell, Jeffrey A. Ivie, Ezra Bussmann +3

Diborane (B $_{2}$ H $_{6}$ ) is a promising molecular precursor for atomic precision p-type doping of silicon that has recently been experimentally demonstrated [T. {Š}kere{ň}, \textit{et…

Reaction pathways of BCl3​ for acceptor delta-doping of silicon

AlCl3​-dosed Si(100)-2×1: Adsorbates, chlorinated Al chains, and incorporated Al

A model for atomic precision p-type doping with diborane on Si(100)-2×1

Reaction pathways of BCl $_{3}$ for acceptor delta-doping of silicon

AlCl $_{3}$ -dosed Si(100)-2 $\times$ 1: Adsorbates, chlorinated Al chains, and incorporated Al

A model for atomic precision p-type doping with diborane on Si(100)-2 $\times$ 1