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Hongzhou Zhang

8 papers hereh-index 438.2k citations137 works total

Matching runs newest-first, so older work may not be attached to this profile yet.

author position
  • last author6

Across the 6 of 8 papers where every author was matched, so the position is known.

fields
  • cond-mat.mtrl-sci5
  • physics.app-ph2
  • cond-mat.mes-hall1
same name
  • Hongzhou Zhang — 2 papers, h 1
  • Hongzhou Zhang — 1 paper, h 0
  • Hongzhou Zhang — 1 paper, h 29

Either other researchers who publish under this name, or the same person where the external sources have not merged their records.

identity via Semantic Scholar / OpenAlex

activity
20162019
most citedOxide-mediated self-limiting recovery of field effect mobility in plasma-treated MoS2​

126 citations · 242 across the 8 of their papers we have counts for

collaborators
Showing physics.app-phShow all

2 papers · 1 filter

physics.app-ph2019

XeF2​-Enhanced Focused Ion Beam Etching and Passivation of GaSb

Pierce Maguire, Darragh Keane, Brian Kelly +2

Focused ion beams (FIBs) are widely used to modify optoelectronic devices, but their utility is severely restricted in some III-V materials due to adverse effects such as nanofibre…

physics.app-ph2018★ 23 cited

Photoresponsivity enhancement in monolayer MoS2​ by rapid O2​:Ar plasma treatment

Jakub Jadwiszczak, Gen Li, Conor P. Cullen +5

We report up to ten-fold enhancement of the photoresponsivity of monolayer MoS2​ by treatment with O2​:Ar (1:3) plasma. We characterize the surface of plasma-exposed MoS2​ by…

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Not affiliated with arXiv. Researcher data from Semantic Scholar (ODC-BY) and OpenAlex.