activity
20082019
most citedElectrical transport properties of graphene on SiO2 with specific surface structures

209 citations · 564 across the 8 of their papers we have counts for

collaborators

9 papers

cond-mat.mtrl-sci2019★ 26 cited

Influence of interface dipole layers on the performance of graphene field effect transistors

Naoka Nagamura, Hirokazu Fukidome, Kosuke Nagashio +8

The linear band dispersion of graphene's bands near the Fermi level gives rise to its unique electronic properties, such as a giant carrier mobility, and this has triggered extensi…

cond-mat.mtrl-sci2016★ 17 cited

Experimental detection of active defects in few layers MoS2 through random telegraphic signals analysis observed in its FET characteristics

Nan Fang, Kosuke Nagashio, Akira Toriumi

Transition-metal dichalcogenides (TMDs), such as molybdenum disulfide (MoS2), are expected to be promising for next generation device applications. The existence of sulfur vacancie…

cond-mat.mtrl-sci2014★ 13 cited

Crystal orientation relation and macroscopic surface roughness in hetero-epitaxially grown graphene on Cu/mica

J. L. Qi, K. Nagashio, T. Nishimura +1

A clean, flat and orientation-identified graphene on a substrate is in high demand for graphene electronics. In this study, the hetero-epitaxial graphene growth on Cu(111)/mica(001…

cond-mat.mtrl-sci2014★ 25 cited

Large Fermi energy modulation in graphene transistors with high-pressure O2-annealed Y2O3 topgate insulators

Kaoru Kanayama, Kosuke Nagashio, Tomonori Nishimura +1

We demonstrate a considerable suppression of the low-field leakage through a Y2O3 topgate insulator on graphene by applying high-pressure O2 at 100 atm during post-deposition annea…

cond-mat.mtrl-sci2013

The density of states of graphene underneath a metal electrode and its correlation with the contact resistivity

Ryota Ifuku, Kosuke Nagashio, Tomonori Nishimura +1

The density of states (DOS) of graphene underneath a metal is estimated through a quantum capacitance measurement of the metal/graphene/SiO2/n+-Si contact structure fabricated by a…

cond-mat.mtrl-sci2011★ 209 cited

Electrical transport properties of graphene on SiO2 with specific surface structures

K. Nagashio, T. Yamashita, T. Nishimura +2

The mobility of graphene transferred on a SiO2/Si substrate is limited to ~10,000 cm2/Vs. Without understanding the graphene/SiO2 interaction, it is difficult to improve the electr…

cond-mat.mtrl-sci2011★ 1 cited

DOS-limited contact resistance in graphene FETs

Kosuke Nagashio, Akira Toriumi

Graphene has attracted much attention as one of promising candidates of future high-speed transistor materials because of its high carrier mobility of more than 10,000 cm2 V-1 s-1.…

cond-mat.mtrl-sci2010★ 107 cited

Systematic Investigation of the Intrinsic Channel Properties and Contact Resistance of Monolayer and Multilayer Graphene FET

Kosuke Nagashio, Tomonori Nishimura, Koji Kita +1

The intrinsic channel properties of monolayer and multilayer graphene were systematically investigated as a function of layer number by the exclusion of contact resistance using fo…

cond-mat.mtrl-sci2008★ 166 cited

Mobility variations in mono- and multi-layer graphene films

Kosuke Nagashio, Tomonori Nishimura, Koji Kita +1

The electric properties of mono- and multi-layer graphene films were systematically studied with the layer number determined by their optical contrast. The current modulation incre…