most citedAb-initio Study of the Trimethylaluminum Atomic Layer Deposition Process on Carbon Nanotubes - An Alternative Initial Step

4 citations · 9 across the 3 of their papers we have counts for

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physics.chem-ph2017★ 2 cited

Theoretical investigation of in situ k-restore processes for damaged ultra-low-k dielectrics

A. Förster, C. Wagner, J. Schuster +1

Ultra-low-k (ULK) materials are essential for today's production of integrated circuits (ICs). However, during the manufacturing process the ULK's low dielectric constant (k-value)…