activity
20172021
most citedThermal stress modelling of diamond on GaN/III-Nitride membranes

54 citations · 97 across the 3 of their papers we have counts for

collaborators

9 papers

physics.soc-ph2021

Gender issues in fundamental physics: Strumia's bibliometric analysis fails to account for key confounders and confuses correlation with causation

Philip Ball, T. Benjamin Britton, Erin Hengel +5

Alessandro Strumia recently published a survey of gender differences in publications and citations in high-energy physics (HEP). In addition to providing full access to the data, c…

physics.app-ph202154 cited

Thermal stress modelling of diamond on GaN/III-Nitride membranes

Jerome A. Cuenca, Matthew D. Smith, Daniel E. Field +8

Diamond heat-spreaders for gallium nitride (GaN) devices currently depend upon a robust wafer bonding process. Bonding-free membrane methods demonstrate potential, however, chemica…

physics.app-ph2020

Ti alloyed -GaO: route towards wide band gap engineering

A. Barthel, J. W. Roberts, M. Napari +6

The suitability of Ti as a band gap modifier for -GaO was investigated, taking advantage of the isostructural α-phases and high band gap difference between TiO a…

cond-mat.mes-hall2020

Polar InGaN/GaN quantum wells: Revisiting the impact of carrier localization on the green gap problem

Daniel S. P. Tanner, Philip Dawson, Menno J. Kappers +2

We present a detailed theoretical analysis of the electronic and optical properties of c-plane InGaN/GaN quantum well structures with In contents ranging from 5% to 25%. Special at…

cond-mat.mes-hall2019

Reduction of radiative lifetime and slow-timescale spectral diffusion in InGaN polarized single-photon sources

Tong Wang, Tongtong Zhu, Tim J. Puchtler +6

Non-polar (11-20) a-plane quantum dots (QDs) are strong candidates for both > 200 K on-chip ultrafast polarized single-photon generation and the investigation of high temperature s…

physics.app-ph2019

Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition

J. W. Roberts, P. R. Chalker, B. Ding +7

Plasma enhanced atomic layer deposition was used to deposit thin films of Ga2O3 on to c-plane sapphire substrates using triethylgallium and O2 plasma. The influence of substrate te…