32 citations · 96 across the 6 of their papers we have counts for
14 papers
Recent advances in Bayesian optimization with applications to parameter reconstruction in optical nano-metrology
Matthias Plock, Sven Burger, Philipp-Immanuel Schneider
Parameter reconstruction is a common problem in optical nano metrology. It generally involves a set of measurements, to which one attempts to fit a numerical model of the measureme…
Optimized diamond inverted nanocones for enhanced color center to fiber coupling
Cem Güney Torun, Philipp-Immanuel Schneider, Martin Hammerschmidt +3
Nanostructures can be used for boosting the light outcoupling of color centers in diamond; however, the fiber coupling performance of these nanostructures is rarely investigated. H…
Grazing incidence X-ray fluorescence based characterization of nanostructures for element sensitive profile reconstruction
Anna Andrle, Philipp Hönicke, Philipp Schneider +6
For the reliable fabrication of the current and next generation of nanostructures it is essential to be able to determine their material composition and dimensional parameters. Usi…
Shape- and element-sensitive reconstruction of periodic nanostructures with grazing incidence X-ray fluorescence analysis and machine learning
Anna Andrle, Philipp Hönicke, Grzegorz Gwalt +4
The characterization of nanostructured surfaces with sensitivity in the sub-nm range is of high importance for the development of current and next generation integrated electronic…
Bayesian optimization with improved scalability and derivative information for efficient design of nanophotonic structures
Xavier Garcia-Santiago, Sven Burger, Carsten Rockstuhl +1
We propose the combination of forward shape derivatives and the use of an iterative inversion scheme for Bayesian optimization to find optimal designs of nanophotonic devices. This…
Efficient Bayesian inversion for shape reconstruction of lithography masks
Nando Farchmin, Martin Hammerschmidt, Philipp-Immanuel Schneider +4
Background: Scatterometry is a fast, indirect and non-destructive optical method for quality control in the production of lithography masks. To solve the inverse problem in complia…