Epitaxial Thin Films of the Giant-Dielectric-Constant Material CaCu_3Ti_4O_{12} Grown by Pulsed-laser Deposition
arXiv:cond-mat/0205153 · doi:10.1063/1.1506951
Abstract
Pulsed-laser deposition has been used to grow epitaxial thin films of the giant-dielectric-constant material CaCu_3Ti_4O_{12} on LaAlO_3 and SrTiO_3 substrates with or without various conducting buffer layers. The latter include YBa_2Cu_3O_7, La_{1.85}Sr_{0.15}CuO_{4+δ} and LaNiO_3. Above 100K - 150K the thin films have a temperature independent dielectric constant as do single crystals. The value of the dielectric constant is of the order of 1500 over a wide temperature region, potentially making it a good candidate for many applications. The frequency dependence of its dielectric properties below 100K - 150K indicates an activated relaxation process.
11 pages, 4 figures
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Cited by in corpus (8)
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- Extrinsic models for the dielectric response of CaCu{3}Ti{4}O{12}
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- Evidence for power-law frequency dependence of intrinsic dielectric response in the CaCuTiO
- Localized polarons and conductive charge carriers: understanding CaCuTiO over a broad temperature range
- CaCu_3Ti_4O_12/CaTiO_3 Composite Dielectrics: A Ba/Pb-free Ceramics with High Dielectric Constants
- Effects of post-anneal conditions on the dielectric properties of CaCu3Ti4O12 thin films prepared on Pt/Ti/SiO2/Si substrates
- Broadband dielectric response of CaCu3Ti4O12: From dc to the electronic transition regime