Ultrahigh interfacial thermal conductance for cooling gallium oxide electronics using cubic boron arsenide
arXiv:2501.11082 · doi:10.1103/17tk-9xwv
Abstract
Gallium oxide (GaO) has attracted significant interest for its unique potential especially in power electronics. However, its low and anisotropic thermal conductivity poses a major challenge for heat dissipation. Here, we explore an effective cooling strategy centering on the heterogeneous integration of -GaO devices with cubic boron arsenide (cBAs), an emerging material with an ultrahigh thermal conductivity of ~1300 WmK. Machine-learned potentials for representative -GaO/cBAs interfaces are trained, enabling accurate and efficient calculation of the interfacial thermal conductance via nonequilibrium molecular dynamics. At 300 K, remarkable values of 74933 MWmK and 82435 MWmK are predicted for Ga-As and O-B bonding across the interface, respectively, which are primarily attributed to the well-matched phonon density of states considering the similar Debye temperatures of -GaO and cBAs. Moreover, finite-element simulations directly show a notable device temperature reduction when comparing cBAs with other substrates. The simultaneously ultrahigh and highlight cBAs as an ideal substrate for GaO electronics.
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