Laser Etch Enabled Active Embedded Microfluidic Cooling in $β$-Ga$_2$O$_3$

Shonkho Shuvro; Roopa Jayaramaiah; Rangarajan Muralidharan; Digbijoy N. Nath; Prosenjit Sen

paper

Laser Etch Enabled Active Embedded Microfluidic Cooling in $β$ -Ga $_{2}$ O $_{3}$

arXiv:2304.02645

Abstract

We demonstrate active embedded microfluidic cooling in $β$ -Ga $_{2}$ O $_{3}$ . We employ a cost-effective infra-red laser etch setup to achieve controlled etching of micro-channels in 500 um thick $β$ -Ga $_{2}$ O $_{3}$ substrate. The micro-channels are about 210 um deep and 340 um wide. Resistive heating is used as proof-of-concept. At a water flow rate of 50 ml/min, a 50% reduction in surface temperature from ~140 $^{\circ}$ C to ~72 $^{\circ}$ C is achieved for 3.5 W of input power. The experimental observations are backed by thermal simulation. This work is expected to lead to a new paradigm in thermal management in emerging $β$ -Ga $_{2}$ O $_{3}$ devices.

10 pages, 5 figures

Laser Etch Enabled Active Embedded Microfluidic Cooling in β-Ga2​O3​

Abstract

Laser Etch Enabled Active Embedded Microfluidic Cooling in $β$ -Ga $_{2}$ O $_{3}$