Acceptor and compensating donor doping of single crystalline SnO (001) films grown by molecular beam epitaxy and its perspectives for optoelectronics and gas-sensing
arXiv:2212.06350 · doi:10.1063/5.0130935
Abstract
(La and Ga)-doped tin monoxide (stannous oxide, tin (II) oxide, SnO) thin films were grown by plasma-assisted and suboxide molecular beam epitaxy with dopant concentrations ranging from cm to cm. In this concentration range, the incorporation of Ga into SnO was limited by the formation of secondary phases observed at cm Ga, while the incorporation of La showed a lower solubility limit. Transport measurements on the doped samples reveal that Ga acts as an acceptor and La as a compensating donor. While Ga doping led to an increase of the hole concentration from cmcm for unintentionally (UID) SnO up to cm, La-concentrations well in excess of the UID acceptor concentration resulted in semi-insulating films without detectable -type conductivity. Ab-initio calculations qualitatively agree with our dopant assignment of Ga and La, and further predict In to act as an acceptor as well as Al and B as donor. These results show the possibilities of controlling the hole concentration in -type SnO, which can be useful for a range of optoelectronic and gas-sensing applications.
6 pages, 5 figures
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