Strong-Coupling Superconductivity with 10.8 K Induced by P Doping in the Topological Semimetal MoSi
arXiv:2208.02392 · doi:10.1007/s40843-022-2102-8
Abstract
By performing P doping on the Si sites in the topological semimetal MoSi, we discover strong-coupling superconductivity in MoSiP (0.5 2.0). MoSi crystallizes in the WSi-type structure with space group of (No. 140), and is not a superconductor itself. Upon P doping, the lattice parameter decreases while increases monotonously. Bulk superconductivity is revealed in MoSiP (0.5 2.0) from resistivity, magnetization, and heat capacity measurements. in MoSiP reaches as high as 10.8 K, setting a new record among the WSi-type superconductors. The upper and lower critical fields for MoSiP are 14.56 T and 105 mT, respectively. Moreover, MoSiP is found to be a fully gapped superconductor with strong electron-phonon coupling. First-principles calculations suggest that the enhancement of electron-phonon coupling is possibly due to the shift of the Fermi level, which is induced by electron doping. The calculations also reveal the nontrivial band topology in MoSi. The and upper critical field in MoSiP are fairly high among pseudobinary compounds. Both of them are higher than those in NbTi, making future applications promising. Our results suggest that the WSi-type compounds are ideal platforms to search for new superconductors. By examinations of their band topologies, more candidates for topological superconductors can be expected in this structural family.
arXiv comment15 pages, 5 figures. Supplementary Information availabe at the corresponding DOI
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