Reduced Material Loss in Thin-film Lithium Niobate Waveguides

Abstract

Thin-film lithium niobate has shown promise for scalable applications ranging from single-photon sources to high-bandwidth data communication systems. Realization of the next generation high-performance classical and quantum devices, however, requires much lower optical losses than the current state of the art ($\sim$10 million). Unfortunately, material limitations of ion-sliced thin-film lithium niobate have not been explored, and therefore it is unclear how high-quality factor can be achieved in this platform. Here we evaluate the material limited quality factor of thin-film lithium niobate photonic platform can be as high as $Q\approx 1.8\times 10^8$ at telecommunication wavelengths, corresponding to a propagation loss of 0.2 dB/m.

References in corpus (5)

• Integrated photonics on thin-film lithium niobate
• Monolithic Ultrahigh-Q Lithium Niobate Microring Resonator
• High-yield wafer-scale fabrication of ultralow-loss, dispersion-engineered silicon nitride photonic circuits
• Towards 1% single photon nonlinearity with periodically-poled lithium niobate microring resonators
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