Gate-versus defect-induced voltage drop and negative differential resistance in vertical graphene heterostructures

Abstract

Vertically stacked two-dimensional (2D) van der Waals (vdW) heterostructures based on graphene electrodes represent a promising architecture for next-generation electronic devices. However, their first-principles characterizations have been so far mostly limited to the equilibrium state due to the limitation of the standard non-equilibrium Green's function approach. To overcome these challenges, we introduce a non-equilibrium first-principles calculation method based on the recently developed multi-space constrained-search density functional formalism and apply it to graphene/few-layer hexagonal boron nitride (hBN)/graphene field-effect transistors. Our explicit finite-voltage first-principles calculations show that the previously reported negative differential resistance (NDR) current-bias voltage characteristics can be produced not only from the gating-induced mismatch between two graphene Dirac cones but from the bias-dependent energetic shift of defect levels. Specifically, for a carbon atom substituted for a nitrogen atom (C${}_N$) within inner hBN layers, the increase of bias voltage is found to induce a self-consistent electron filling of in-gap C${}_N$ states, which leads to changes in voltage drop profiles and symmetric NDR characteristics. On the other hand, with a C${}_N$ placed on outer interfacial hBN layers, we find that due to the pinning of C${}_N$ levels to nearby graphene states voltage drop profiles become bias-independent and NDR peaks disappear. Revealing hitherto undiscussed non-equilibrium behaviors of atomic defect states and their critical impact on device characteristics, our work points towards future directions for the computational design of 2D vdW devices

11 pages, 5 figures

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