Silicon cantilevers locally heated from 300K up to the melting point: temperature profile measurement from their resonances frequency shift

Abstract

When heated, micro-resonators present a shift of their resonance frequencies. We study specifically silicon cantilevers heated locally by laser absorption, and evaluate theoretically and experimentally their temperature profile and its interplay with the mechanical resonances. We present a enhanced version of our earlier model [F. Aguilar Sandoval et al., J. Appl. Phys. 117, 234503 (2015)] including both elasticity and geometry temperature dependency, showing that the latter can account for 20% of the observed shift for the first flexural mode. The temperature profile description takes into account thermal clamping conditions, radiation at high temperature, and lower conductivity than bulk silicon due to phonon confinement. Thanks to a space-power equivalence in the heat equation, scanning the heating point along the cantilever directly reveals the temperature profile. Finally, frequency shift measurement can be used to infer the temperature field with a few percent precision.

References in corpus (4)

• Direct Measurement of Room Temperature Non-diffusive Thermal Transport Over Micron Distances in a Silicon Membrane
• Radiative Heat Transfer in Free-Standing Silicon Nitride Membranes
• Resonance frequency shift of strongly heated micro-cantilevers
• Silicon cantilevers locally heated from 300K up to the melting point: temperature profile measurement from their resonances frequency shift

Cited by in corpus (7)

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• Force microscopy cantilevers locally heated in a fluid: temperature fields and effects on the dynamics
• Linking fluctuation and dissipation in spatially extended out-of-equilibrium systems
• Accelerating the heat diffusion: fast thermal relaxation of a microcantilever
• Detection of Mechanical Deformation Induced by Ultrafast Laser Irradiation upon a Metallic Cantilever