Ferroelectric tunnel junctions
arXiv:2011.07864
Abstract
My research is dedicated to the electronic properties of functional oxides. My activity specifically focuses on ferroelectric tunnel junctions in which an ultrathin layer of ferroelectric material is intercalated between two metallic electrodes. In these devices, polarization reversal induces large modifications of the tunnel resistance, leading to a non-destructive readout of the information. After a demonstration of the concept with scanning probe microscopy techniques, I have been exploring the properties of ferroelectric tunnel junctions with various ferroelectric materials (BaTiO3, BiFeO3, and PVDF). I showed that these devices possess attractive properties for applications as non-volatile binary memories. In addition, exploring the fact that polarization usually reverses by the nucleation and propagation of domains, I demonstrated a memristive behavior in the junctions associated to non-uniform configurations of ferroelectric domains. Such ferroelectric memristors can be used as artificial synapses in neuromorphic architectures. Coupled to magnetic electrodes, the resulting multiferroic tunnel junctions enable a non-volatile control of magnetism at the ferroelectric/electrode interface and of the spin-polarized current associated. Besides this main activity on tunnel devices, I explored the influence of ferroelectricity on magnetic orders and on the properties of functional oxides.
arXiv commentThis is my Habilitation Thesis (HDR), defended July 13th 2017, in front of the jury composed of: Philippe Lecoeur (C2N, Paris-Saclay), Agnes Barthelemy (CNRS-Thales, Paris-Saclay), Brahim Dkhil (CentraleSupelec), Josep Fontcuberta (ICMAB), Alexei Gruverman (Univ. Nebraska), Jacobo Santamaria (Univ. Complutense Madrid)
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